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University of Wyoming

UW Technologies Available for Licensing

 

Technology Disclosure: 03-004 - Shamrock Surfactants for the Remediation of Heavy Metal Ion Contamination


Background

Although current methods exist for the remediation of water and other materials that have been contaminated with heavy metal ions, none have been developed that are truly efficient. In order to be effective, current remediation methods generally require two components: a host surfactant and a lipophilic ligand that coordinates to metal ions. 


Summary

Researchers in the University of Wyoming’s Department of Chemistry are currently developing a novel remediation method through the use of shamrock surfactants. These unique surfactants are named so because they have two head groups connected to a central head group by hydrocarbon chains. Containing three heads, this structure resembles that of a shamrock, which has leaflets in groups of three.

Shamrock surfactants offer a different and perhaps superior type of ligand-based water-remediation process. With them, no host surfactant is required because the aggregate-forming surfactant also contains the ligand. This implies that shamrock surfactants have the potential to be far more effective than current remediation methods.

This technology is protected under published PCT application


Applications

This technology could have a significant impact on the remediation of water and other materials contaminated with heavy-metal ions, in any industry with the need for pollution control.

It is also possible that some of the new shamrock surfactants will possess unique physical properties, compared to conventional surfactants, which could be used to advantage in other applications of surfactants.

If you would like to learn more about this novel method for the remediation of water and other materials contaminated with heavy metal ions or how your company can apply it in commercial situations, feel free to contact the director of the Wyoming Research Products Center, Davona Douglass. We would be happy to share more information with you.